SCIL Nanoimprint solutions

SCIL Nanoimprint solutions provides cost effective, robust, high yield manufacturing solutions for micro and nano-optics. Our portfolio includes optimized equipment, consumable materials and services for customers: 

Feature sizes down to less than 10 nm and overlay alignment below 1 µm on wafers up to 300mm

Unique inorganic optical imprint materials with refractive index from 1.2-2.0 and low haze

Process support to our customers

Our SCIL application center can produce samples and perform pilot runs needed for qualification and scaling to volume production.